X-Ray
Diffractometry
This
facility is used to determine the structure of unknown samples
which are in single crystal or polycrystalline form. Samples
to be identified may be powders or bulk materials. The X-Ray
diffraction pattern of a compound provide a characteristic
fingerprint enabling us to identify the components phases,
the degree of crystallinity, orientation etc. of the compound.
The instrument is also occupied with a heating device inorder
to study. The influence of heat upon the properties of the
sample such as transformation decomposition. The heating environment
can be vacuum, air or a specific gas.
Thin
Film Coating
A
facility is available to deposit elemental thin films on glass
and other substrates such as polish, silicon wafers. The system
operates under high vacuum condition giving film of high purity.
Films with thickness ranging from hundreds of microns to hundreds
of angstroms can be fabricated.
High Temperature Treatments
A
high temperature muffle furnace is available for heat treating
clay, metals etc. The instrument operate in temperature range
of 250 C - 1150 C. A digital temperature controller with a
micro processor offers heat treatment condition with excellent
reproducibility.
An
additional facility is available for heat treating solid samples
such as powdered materials and thin films. Researches interested
in temperature dependent characterization methods of samples
can use this furnace under various ambient conditions like
vacuum and inert gas environments. Micro processor assisted
temperature controller provide stable annealing temperatures
of high accuracy.
|